Memory device manufacturing method

ABSTRACT

A method for making a memory device includes providing a dielectric material, having first and second upwardly and inwardly tapering surfaces and a surface segment connecting the first and second surfaces. First and second electrodes are formed over the first and second surfaces. A memory element is formed over the surface segment to electrically connect the first and second electrodes.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of U.S. application Ser. No. 11/279,945 filed 17 Apr. 2006.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to high density memory devices based on memory materials, for example resistor random access memory (RRAM) devices, the memory material switchable between electrical property states by the application of energy. The memory materials may be phase change based memory materials, including chalcogenide based materials and other materials, and to methods for manufacturing such devices.

2. Description of Related Art

Phase change based memory materials are widely used in read-write optical disks. These materials have at least two solid phases, including for example a generally amorphous solid phase and a generally crystalline solid phase. Laser pulses are used in read-write optical disks to switch between phases and to read the optical properties of the material after the phase change.

Phase change based memory materials, like chalcogenide based materials and similar materials, also can be caused to change phase by application of electrical current at levels suitable for implementation in integrated circuits. The generally amorphous state is characterized by higher resistivity than the generally crystalline state; this difference in resistance can be readily sensed to indicate data. These properties have generated interest in using programmable resistive material to form nonvolatile memory circuits, which can be read and written with random access.

The change from the amorphous to the crystalline state is generally a lower current operation. The change from crystalline to amorphous, referred to as reset herein, is generally a higher current operation, which includes a short high current density pulse to melt or breakdown the crystalline structure, after which the phase change material cools quickly, quenching the phase change process, allowing at least a portion of the phase change structure to stabilize in the amorphous state. It is desirable to minimize the magnitude of the reset current used to cause transition of phase change material from crystalline state to amorphous state. The magnitude of the reset current needed for reset can be reduced by reducing the size of the phase change material element in the cell and by reducing the size of the contact area between electrodes and the phase change material, so that higher current densities are achieved with small absolute current values through the phase change material element.

One direction of development has been toward forming small pores in an integrated circuit structure, and using small quantities of programmable resistive material to fill the small pores. Patents illustrating development toward small pores include: Ovshinsky, “Multibit Single Cell Memory Element Having Tapered Contact,” U.S. Pat. No. 5,687,112, issued Nov. 11, 1997; Zahorik et al., “Method of Making Chalogenide [sic] Memory Device,” U.S. Pat. No. 5,789,277, issued Aug. 4, 1998; Doan et al., “Controllable Ovonic Phase-Change Semiconductor Memory Device and Methods of Fabricating the Same,” U.S. Pat. No. 6,150,253, issued Nov. 21, 2000.

Problems have arisen in manufacturing such devices with very small dimensions, and with variations in process that meet tight specifications needed for large-scale memory devices. It is desirable therefore to provide a memory cell structure having small dimensions and low reset currents, and a method for manufacturing such structure.

SUMMARY OF THE INVENTION

A first aspect of the invention is directed to a method for making a memory device. A dielectric material, having first and second upwardly and inwardly tapering surfaces and a surface segment connecting the first and second surfaces, is provided. First and second electrodes are formed over the first and second surfaces. A memory element is formed over the surface segment to electrically connect the first and second electrodes.

A second aspect of the invention is directed to a method for making a memory device of the type including a bridge-type memory material element switchable between electrical property states by the application of energy. An electrode structure, comprising first and second electrode elements separated by a separation material, is formed. A dielectric material is deposited onto an end surface of the separation material using a high density plasma (HDP) deposition procedure. The deposition of the dielectric material is controlled to create a dielectric material cap on the end surface, the dielectric material cap having upwardly and inwardly tapering surfaces. An electrically conductive material is deposited to contact the electrode elements and to extend along the tapering sides of the dielectric material thus creating first and second electrodes. The electrically conductive material and the dielectric material cap are planarized to create first and second outer surfaces on the first and second electrodes and a surface segment on the dielectric material. The surface segment connects the tapering sides and has a length measured between the tapering sides. At least one of the dielectric material depositing step and the planarizing step is controlled so that the length is within a chosen dimensional range. A bridge-type memory material element is formed over the surface segment and in electrical contact with portions of the first and second outer surfaces. Energy passing along an inter-electrode path between the first and second electrodes and across the surface segment of the dielectric member is concentrated within the memory material element so to facilitate changing an electrical property state of the memory material element.

The method described herein for formation of a memory cell device and, for example, in an RRAM device, can be used to make small phase change gates, bridges or similar structures for other devices.

Various features and advantages of the invention will appear from the following description in which the preferred embodiments have been set forth in detail in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a simplified cross-sectional view of a memory device made according to the invention;

FIGS. 2-9 illustrate methods for making memory devices, such as the device of FIG. 1;

FIG. 2 illustrates the result of the formation of lower electrode elements on a base covered by protective elements;

FIG. 3 illustrates the result of depositing a separation material onto the structure of FIG. 2;

FIG. 4 illustrates the result of etching the protective elements from the structure of FIG. 3 to expose the lower electrode elements;

FIG. 5 shows the result of depositing a dielectric material using a high-density plasma deposition procedure;

FIGS. 6 and 7 are simplified illustrations of generally straight and stair-stepped tapered surfaces;

FIG. 8 shows the structure of FIG. 5 after removal of the dielectric material from the lower electrode elements followed by depositing an electrically conductive material onto the structure; and

FIG. 9 shows the structure of FIG. 8 after a chemical mechanical polishing step.

DETAILED DESCRIPTION

The following description of the invention will typically be with reference to specific structural embodiments and methods. It is to be understood that there is no intention to limit the invention to the specifically disclosed embodiments and methods but that the invention may be practiced using other features, elements, methods and embodiments. Like elements in various embodiments are commonly referred to with like reference numerals.

FIG. 1 shows a memory device 10 having first and second electrodes 12, 14 on an intermetallic dielectric base 16. Each electrode comprises a lower electrode element 18, typically comprising tungsten, aluminum, copper, other metals commonly used in integrated circuit manufacturing, or other conductive material, adjacent to base 16 and an upper electrode element 20, typically made of TiN. Electrodes 12, 14 are separated by an electrode separation element 22. Electrode separation element includes a lower portion 24 of a separation material, typically a dielectric fill such as silicon dioxide, and an upper portion 26. Upper portion 26 has upwardly and inwardly tapering sides 28, the sides being joined by a surface segment 30. Upper portion 26 is made of a dielectric material deposited using high-density plasma (HDP) deposition procedures as discussed below. A bridge-type memory material element 32 is positioned on the surface segment 30 and extends over and contacts the outer surface 34 of upper electrode element 20 of first and second electrodes 12, 14. As indicated by arrow 36, current flows along an inter-electrode path between first and second electrodes and through memory material element 32 causing the central, active region 38 to change one or more electrical characteristics, such as resistance, upon the application of an appropriate current flow.

FIGS. 2-9 illustrate steps for creating memory device 10, as well as other memory devices, according to the invention. In FIG. 2 lower electrode elements 18 are formed on base 16 and have protective cap elements 40 formed thereon. Elements 40 are typically made of SiN or another suitable protective material and act as a protective layer for lower electrode elements 18 during subsequent processing steps. FIG. 3 shows a separation material 42 deposited on the structure of FIG. 2 followed by chemical mechanical polishing (CMP) to create an end surface 44. In FIG. 4 open regions 46 are formed by the removal of elements 40. Open regions 46 of are bounded by lower electrode elements 18 and inside surfaces 48 of separation material 42.

FIG. 5 illustrates the result of the HDP CVD deposition of a dielectric material 50 creating cap 26. In addition to being deposited on end surface 44, dielectric material 50 is also deposited on side surfaces 48 and lower electrode elements 18.

During HDP CVD deposition both deposition and etching occurs to create the characteristic triangular shape with upwardly and inwardly tapering surfaces. General information on the HDP process can be found in the textbook “Introduction to Semiconductor Manufacturing Technology” in chapter 10 Section 7 (10.7).

One recipe that can be used to control the ratio of deposition to etching during the HDP CVD process to achieve the desired height, shape and taper angles is as follows.

-   -   1. SiH4: 95 sccm/Ar: 390 sccm/O2: 150 sccm/Plasma Heat ˜300C/Top         plasma power 3550 W/Bottom Plasma power 2700 W/He: 8 sccm.     -   2. The Etch/dep ratio of HDP process could be controlled by Top         plasma power & Bottom Plasma Power. Higher Plasma power will         increase the plasma etch rate and increase the Etch/dep ratio         because plasma Etch is enhanced.

Tapering surfaces 28 are illustrated as straight lines in FIG. 5. FIG. 6 illustrates an example of generally straight tapering surfaces 28 while FIG. 7 illustrates stair-stepped tapering surfaces 28. Other types of tapering surfaces 28 may also be created.

The dielectric material 50 covering lower electrode elements 18 is etched to expose the lower electrode elements 18. This is preferably accomplished using a slightly anisotropic etch procedure. FIG. 8 illustrates the result of depositing an electrically conductive material 52 onto the structure of FIG. 5 after this etch procedure. Material 52 may be TiN because of its good compatibility with memory material element 32; other appropriate materials may also be used. FIG. 9 illustrates results of a CMP process to create first and second electrodes 12, 14 having outer surfaces 54 and surface segment 30. In the preferred embodiment outer surfaces 54 and surface segment 30 are coplanar. However, in some cases they need not be coplanar. The length 56 of surface segment 30 is typically about 10 to 100 nm, and in one embodiment is about 20 nm long. The angle between tapering surfaces 28 and the length 56 of surface segment 30 affects the amount of chemical mechanical polishing that must be done to the structure of FIG. 8 to achieve the structure of FIG. 9.

Thereafter memory material element 32, see FIG. 1, is formed on surface segment 30 so to contact outer surfaces 54 of first and second electrodes 12. Memory material element 32 is typically GST but, as discussed below, memory material element 32 could be made of other materials as well. The length of contact between memory material element 32 and surfaces 54 should be sufficient to provide effective electrical contact between the surfaces, and to allow for alignment tolerances of the photolithographic process used in patterning the memory material element, without being excessively long. The thickness of memory material element 32 (the vertical height in FIG. 1) is small as is practical given the material chosen and its manner of deposition. For GST, the thickness is typically about 10 to 50 nm, and in one embodiment is about 20 nm. The width of memory material element 32 (the dimension into the page in FIG. 1) is typically about 40 to 100 nm, and again should be as small as practical given the material chosen and the manner in which the pattern is defined; in one embodiment the width of memory material 32 is about 30˜100 nm.

One of the advantages of the present invention is that the current needed to, for example, change the resistance of memory material element 32 at central region 38 is reduced because the volume of phase change material in the central, active region is very small. The invention facilitates scaling so that the process should work as critical dimensions on chips shrink.

Another advantage of the invention is that two of the dimensions for memory material element 32, that is length 56 and the thickness (measured in the vertical direction in the figures) of element 32, are not dependent upon lithographic techniques. In addition, while the location of and length of memory material element 32 are typically determined by lithographic techniques, neither is critical because the amount of overlap between memory material 32 and surface 34 of the electrodes can vary within a relatively wide range of distances.

The length 56 of surface segment 30 is not pattern defined, that is not defined by photolithography, and not by etch selectivity, as in the sidewall methods. Rather, length 56 is defined by the CMP process, and the control over the stop point of the CMP.

Upper electrode elements 20 in the illustrated embodiment are preferably made of TiN. Although other materials, such as TaN, TiAlN or TaAlN, may be used for upper electrode elements 20, TiN is presently preferred because it makes good contact with GST as memory material element 32, it is a common material used in semiconductor manufacturing, and it provides a good diffusion barrier at the higher temperatures at which GST-type of memory material transitions, typically in the 600-700° C. range.

Embodiments of memory device 10 include phase change based memory materials, including chalcogenide based materials and other materials, for memory material element 32. Chalcogens include any of the four elements oxygen (O), sulfur (S), selenium (Se), and tellurium (Te), forming part of group VI of the periodic table. Chalcogenides comprise compounds of a chalcogen with a more electropositive element or radical. Chalcogenide alloys comprise combinations of chalcogenides with other materials such as transition metals. A chalcogenide alloy usually contains one or more elements from column six of the periodic table of elements, such as germanium (Ge) and tin (Sn). Often, chalcogenide alloys include combinations including one or more of antimony (Sb), gallium (Ga), indium (In), and silver (Ag). Many phase change based memory materials have been described in technical literature, including alloys of: Ga/Sb, In/Sb, In/Se, Sb/Te, Ge/Te, Ge/Sb/Te, In/Sb/Te, Ga/Se/Te, Sn/Sb/Te, In/Sb/Ge, Ag/In/Sb/Te, Ge/Sn/Sb/Te, Ge/Sb/Se/Te and Te/Ge/Sb/S. In the family of Ge/Sb/Te alloys, a wide range of alloy compositions may be workable. The compositions can be characterized as Te_(a)Ge_(b)Sb100_(−(a+b)).

One researcher has described the most useful alloys as having an average concentration of Te in the deposited materials well below 70%, typically below about 60% and ranged in general from as low as about 23% up to about 58% Te and most preferably about 48% to 58% Te. Concentrations of Ge were above about 5% and ranged from a low of about 8% to about 30% average in the material, remaining generally below 50%. Most preferably, concentrations of Ge ranged from about 8% to about 40%. The remainder of the principal constituent elements in this composition was Sb. These percentages are atomic percentages that total 100% of the atoms of the constituent elements. (Ovshinsky '112 patent, columns 10-11.) Particular alloys evaluated by another researcher include Ge₂Sb₂Te₅, GeSb₂Te₄ and GeSb₄Te₇. (Noboru Yamada, “Potential of Ge—Sb—Te Phase-Change Optical Disks for High-Data-Rate Recording”, SPIE v.3109, pp. 28-37 (1997).) More generally, a transition metal such as chromium (Cr), iron (Fe), nickel (Ni), niobium (Nb), palladium (Pd), platinum (Pt) and mixtures or alloys thereof may be combined with Ge/Sb/Te to form a phase change alloy that has programmable resistive properties. Specific examples of memory materials that may be useful are given in Ovshinsky '112 at columns 11-13, which examples are hereby incorporated by reference.

Phase change alloys are capable of being switched between a first structural state in which the material is in a generally amorphous solid phase, and a second structural state in which the material is in a generally crystalline solid phase in its local order in the active channel region of the cell. These alloys are at least bistable. The term amorphous is used to refer to a relatively less ordered structure, more disordered than a single crystal, which has the detectable characteristics such as higher electrical resistivity than the crystalline phase. The term crystalline is used to refer to a relatively more ordered structure, more ordered than in an amorphous structure, which has detectable characteristics such as lower electrical resistivity than the amorphous phase. Typically, phase change materials may be electrically switched between different detectable states of local order across the spectrum between completely amorphous and completely crystalline states. Other material characteristics affected by the change between amorphous and crystalline phases include atomic order, free electron density and activation energy. The material may be switched either into different solid phases or into mixtures of two or more solid phases, providing a gray scale between completely amorphous and completely crystalline states. The electrical properties in the material may vary accordingly.

Phase change alloys can be changed from one phase state to another by application of electrical pulses. It has been observed that a shorter, higher amplitude pulse tends to change the phase change material to a generally amorphous state. A longer, lower amplitude pulse tends to change the phase change material to a generally crystalline state. The energy in a shorter, higher amplitude pulse is high enough to allow for bonds of the crystalline structure to be broken and short enough to prevent the atoms from realigning into a crystalline state. Appropriate profiles for pulses can be determined, without undue experimentation, specifically adapted to a particular phase change alloy. A material useful for implementation of an RRAM device described herein is Ge₂Sb₂Te₅, commonly referred to as GST. Other types of phase change materials can also be used.

The invention has been described with reference to phase change materials. However, other memory materials, also sometimes referred to as programmable materials, can also be used. As used in this application, memory materials are those materials having electrical properties, such as resistance, that can be changed by the application of energy; the change can be a stepwise change or a continuous change or a combination thereof. Other programmable resistive memory materials may be used in other embodiments of the invention, including N₂ doped GST, Ge_(x)Sb_(y), or other material that uses different crystal phase changes to determine resistance; Pr_(x)Ca_(y)MnO₃, PrSrMnO, ZrO_(x), or other material that uses an electrical pulse to change the resistance state; 7,7,8,8-tetracyanoquinodimethane (TCNQ), methanofullerene 6,6-phenyl C61-butyric acid methyl ester (PCBM), TCNQ-PCBM, Cu-TCNQ, Ag-TCNQ, C₆₀-TCNQ, TCNQ doped with other metal, or any other polymer material that has bistable or multi-stable resistance state controlled by an electrical pulse. Further examples of programmable resistive memory materials include GeSbTe, GeSb, NiO, Nb—SrTiO₃, Ag—GeTe, PrCaMnO, ZnO, Nb₂O₅, Cr—SrTiO₃.

The following are short summaries describing four types of resistive memory materials.

1. Challecogenide Material

-   -   Ge_(x)Sb_(y)Te_(z)     -   x:y:z=2:2:5     -   Or other compositions with x: 0˜5; y: 0˜5; z: 0˜10     -   GeSbTe with doping, such as N—, Si—, Ti—, or other element         doping may also be used.     -   Formation method: By PVD sputtering or magnetron-sputtering         method with reactive gases of Ar, N₂, and/or He, etc @ the         pressure of 1 mtorr˜100 mtorr. The deposition is usually done at         room temperature. The collimater with aspect ratio of 1˜5 can be         used to improve the fill-in performance. To improve the fill-in         performance, the DC bias of several ten to several hundred volts         is also used. On the other hand, the combination of DC bias and         the collimater can be used simultaneously.     -   The post deposition annealing treatment with vacuum or N2         ambient is sometimes needed to improve the crystallize state of         challecogenide material. The annealing temperature typically         ranges 100C to 400C with an anneal time of less than 30 minutes.     -   The thickness of challecogenide material depends on the design         of cell structure. In general, a challecogenide material with         thickness of higher than 8 nm can have a phase change         characterization so that the material exhibits at least two         stable resistance states.

2. CMR (Colossal Magnetoresistance) Material

-   -   Pr_(x)Ca_(y)MnO₃     -   x:y=0.5:0.5     -   Or other compositions with x: 0˜1; y: 0˜1     -   Another CMR material that includes Mn oxide may be used     -   Formation method: By PVD sputtering or magnetron-sputtering         method with reactive gases of Ar, N₂, O₂, and/or He, etc. at the         pressure of 1 mtorr˜100 mtorr. The deposition temperature can         range from room temperature to ˜600C, depending on the post         deposition treatment condition. A collimater with an aspect         ratio of 1˜5 can be used to improve the fill-in performance. To         improve the fill-in performance, the DC bias of several ten to         several hundred volts is also used. On the other hand, the         combination of DC bias and the collimater can be used         simultaneously. A magnetic field of several ten gauss to 10,000         gauss may be applied to improve the magnetic crystallized phase.

The post deposition annealing treatment with vacuum or N₂ ambient or O₂/N₂ mixed ambient may be needed to improve the crystallized state of CMR material. The annealing temperature typically ranges 400C to 600C with an anneal time of less than 2 hours.

The thickness of CMR material depends on the design of cell structure. The CMR thickness of 10 nm to 200 nm can be used to be the core material.

A buffer layer of YBCO (YBaCuO3, a kind of high temperature superconductor material) is often used to improve the crystallized state of CMR material. The YBCO is deposited before the deposition of CMR material. The thickness of YBCO ranges 30 nm to 200 nm.

3.2—Element Compound

-   -   Ni_(x)O_(y); Ti_(x)O_(y); Al_(x)O_(y); W_(x)O_(y); Zn_(x)O_(y);         Zr_(x)O_(y); Cu_(x)O_(y); etc     -   x:y=0.5:0.5     -   Other compositions with x: 0˜1; y: 0˜1

Formation Method:

-   -   1. Deposition: By PVD sputtering or magnetron-sputtering method         with reactive gases of Ar, N₂, O₂, and/or He, etc. at the         pressure of 1 mtorr˜100 mtorr, using a target of metal oxide,         such as Ni_(x)O_(y); Ti_(x)O_(y); Al_(x)O_(y); W_(x)O_(y);         Zn_(x)O_(y); Zr_(x)O_(y); Cu_(x)O_(y); etc. The deposition is         usually done at room temperature. A collimater with an aspect         ratio of 1˜5 can be used to improve the fill-in performance. To         improve the fill-in performance, the DC bias of several ten to         several hundred volts is also used. If desired, they combination         of DC bias and the collimater can be used simultaneously.     -   The post deposition annealing treatment with vacuum or N₂         ambient or O₂/N₂ mixed ambient as sometimes needed to improve         the oxygen distribution of metal oxide. The annealing         temperature ranges 400C to 600C with an anneal time of less than         2 hours.

2. Reactive deposition: By PVD sputtering or magnetron-sputtering method with reactive gases of Ar/O₂, Ar/N₂/O₂, pure O₂, He/O₂, He/N₂/O₂ etc. at the pressure of 1 mtorr˜100 mtorr, using a target of metal oxide, such as Ni, Ti, Al, W, Zn, Zr, or Cu etc. The deposition is usually done at room temperature. A collimater with an aspect ratio of 1˜5 can be used to improve the fill-in performance. To improve the fill-in performance, a DC bias of several ten to several hundred volts is also used. If desired, the combination of DC bias and the collimater can be used simultaneously.

-   -   The post deposition annealing treatment with vacuum or N₂         ambient or O₂/N₂ mixed ambient is sometimes needed to improve         the oxygen distribution of metal oxide. The annealing         temperature ranges 400C to 600C with an anneal time of less than         2 hours.     -   3. Oxidation: By a high temperature oxidation system, such as         furnace or RTP system. The temperature ranges from 200C to 700C         with pure O₂ or N₂/O₂ mixed gas at a pressure of several mtorr         to 1 atm. The time can range several minute to hours. Another         oxidation method is plasma oxidation. An RF or a DC source         plasma with pure O₂ or Ar/O₂ mixed gas or Ar/N₂/O₂ mixed gas at         a pressure of 1 mtorr to 100 mtorr is used to oxidize the         surface of metal, such as Ni, Ti, Al, W, Zn, Zr, or Cu etc. The         oxidation time ranges several seconds to several minutes. The         oxidation temperature ranges room temperature to 300C, depending         on the degree of plasma oxidation.

4. Polymer Material

-   -   TCNQ with doping of Cu, C₆₀, Ag etc.     -   PCBM-TCNQ mixed polymer     -   Formation Method:     -   1. Evaporation: By thermal evaporation, e-beam evaporation, or         molecular beam epitaxy (MBE) system. A solid-state TCNQ and         dopent pellets are co-evaporated in a single chamber. The         solid-state TCNQ and dopent pellets are put in a W-boat or a         Ta-boat or a ceramic boat. A high electrical current or an         electron-beam is applied to melt the source so that the         materials are mixed and deposited on wafers. There are no         reactive chemistries or gases. The deposition is done at a         pressure of 10-4 torr to 10-10 torr. The wafer temperature         ranges from room temperature to 200C.     -   The post deposition annealing treatment with vacuum or N₂         ambient is sometimes needed to improve the composition         distribution of polymer material. The annealing temperature         ranges room temperature to 300C with an anneal time of less than         1 hour.     -   2. Spin-coat: By a spin-coater with the doped-TCNQ solution @         the rotation of less than 1000 rpm. After spin-coating, the         wafer is put to wait the solid-state formation @ room         temperature or temperature of less than 200C. The waiting time         ranges from several minutes to days, depending on the         temperature and on the formation conditions.

For additional information on the manufacture, component materials, use and operation of phase change random access memory devices, see U.S. patent application Ser. No. 11/155,067, filed 17 Jun. 2005, entitled Thin Film Fuse Phase Change Ram And Manufacturing Method.

The above descriptions may have used terms such as above, below, top, bottom, over, under, et cetera. These terms are used to aid understanding of the invention are not used in a limiting sense.

While the present invention is disclosed by reference to the preferred embodiments and examples detailed above, it is to be understood that these examples are intended in an illustrative rather than in a limiting sense. It is contemplated that modifications and combinations will occur to those skilled in the art, which modifications and combinations will be within the spirit of the invention and the scope of the following claims.

Any and all patents, patent applications and printed publications referred to above are hereby incorporated by reference. 

1. A method for making a memory device comprising: providing a dielectric material having first and second upwardly and inwardly tapering surfaces and a surface segment connecting the first and second surfaces, the dielectric material providing step comprising: depositing the dielectric material onto a surface; controlling the dielectric material depositing step to create a dielectric material cap comprising said first and second upwardly and inwardly tapering surfaces, the controlling step being the direct cause of the first and second upwardly and inwardly tapering surfaces; and forming the surface segment by planarizing the dielectric material cap; forming first and second electrodes over the first and second surfaces; and forming a memory element over the surface segment to create an inter-electrode path through the memory element between the first and second electrodes so that during use current flows along the inter-electrode path between the first and second electrodes.
 2. The method according to claim 1, wherein the electrodes forming step is carried out so that the first and second electrodes directly contact the first and second surfaces.
 3. The method according to claim 1, wherein the providing step is carried out so that the surface segment has a length measured between the first and second surfaces, the length being between 10 nm and 100 nm.
 4. The method according to claim 1, wherein the electrodes forming step is carried out so that the first and second electrodes have outer surfaces generally coplanar with the surface segment.
 5. The method according to claim 4, wherein the memory element is formed so to directly contact the outer surfaces of the first and second electrodes and the surface segment of the dielectric material.
 6. The method according to claim 1, wherein the memory element forming step is carried out using a phase change material for the memory element, and the electrodes forming step is carried out so that the first and second electrodes comprise TiN.
 7. The method according to claim 1, wherein the first and second surfaces are straight surfaces.
 8. A method for making a memory device of the type including a bridge-type memory material element switchable between electrical property states by the application of energy, the method comprising: forming an electrode structure comprising first and second electrode elements separated by a separation material, the separation material having an end surface; depositing a dielectric material onto the end surface using a high density plasma (HDP) deposition procedure; controlling the dielectric material depositing step to create a dielectric material cap on the end surface, the dielectric material cap having upwardly and inwardly tapering surfaces; depositing an electrically conductive material to contact the electrode elements and to extend along the tapering sides of the dielectric material thus creating first and second electrodes; planarizing the electrically conductive material and the dielectric material cap to create first and second outer surfaces on the first and second electrodes and a surface segment on the dielectric material, the surface segment connecting the tapering sides, the surface segment having a length measured between the tapering sides; controlling at least one of the dielectric material depositing step and the planarizing step so that the length is within a chosen dimensional range; and forming a bridge-type memory material element over the surface segment and in electrical contact with portions of the first and second outer surfaces; whereby energy passing along an inter-electrode path between the first and second electrodes and across the surface segment of the dielectric member is concentrated within the memory material element so to facilitate changing an electrical property state of the memory material element.
 9. The method according to claim 8, wherein the electrode structure forming step comprises: forming the first and second electrodes on a base, each electrode element covered by a protective cap element; forming a layer of the separation material on the base and between the electrodes and protective cap elements, the separation material having side surfaces opposite the electrodes and cap elements; and removing the protective cap elements to create open regions bounded by the electrode elements and the side surfaces; and wherein: the dielectric material depositing step deposits the dielectric material onto the end and side surfaces.
 10. The method according to claim 8, wherein the electrically conductive material depositing step is carried out so that the electrically conductive material contacts the tapering sides.
 11. The method according to claim 8, wherein the planarizing step is carried out so that the first and second outer surfaces and the surface segment are generally coplanar.
 12. The method according to claim 8, wherein the step of controlling at least one of the dielectric material depositing step and the planarizing step are carried out with chosen dimension being between 10 nm and 100 nm.
 13. The method according to claim 8, wherein the step of controlling at least one of the dielectric material depositing step and the planarizing step is carried out with chosen dimension being between 30 nm and 100 nm.
 14. The method according to claim 8, wherein the step of controlling the dielectric material depositing step is carried out so that the inwardly tapering surfaces meet at a junction.
 15. The method according to claim 8, wherein the memory material element forming step is carried out so that the memory material element is in contact with the surface segment.
 16. A method for making a memory device comprising: providing a dielectric material having first and second upwardly and inwardly tapering surfaces and a surface segment connecting the first and second surfaces, the dielectric material providing step comprising: depositing the dielectric material onto a surface by using a high density plasma deposition procedure; controlling the dielectric material depositing step to create a dielectric material cap comprising said first and second upwardly and inwardly tapering surfaces, the controlling step being the direct cause of the first and second upwardly and inwardly tapering surfaces; and forming the surface segment; forming first and second electrodes over the first and second surfaces; and forming a memory element over the surface segment to create an inter-electrode path through the memory element between the first and second electrodes so that during use current flows along the inter-electrode path between the first and second electrodes. 